This concept opens up new avenues in large area nanoconstruction, for example in templating nanowires, which is currently under investigation.
To ensure the survival of Moore’s law and the success of the nanoelectronics industry, alternative patterning techniques that offer advantages beyond conventional top-down patterning are aggressively being explored.
Can self-assembly based technologies offer advantages beyond conventional top-down lithography approaches?
A joint effort of the Aalto University of Helsinki, the Politecnico di Milano, and VTT Technical Research Centre of Finland has now demonstrated that it is possible to align molecular self-assemblies from nanometers to millimeters without the intervention of external stimuli.
Read more . . .
The Latest on: Molecular self-assembly
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The Latest on: Molecular self-assembly
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